4. Coating apparatus
  5. Gas or vapor deposition
  6. Multizone chamber

Paul M. Kozlowski

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Thin germanium oxynitride gate dielectric for...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

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UHV horizontal hot wall cluster CVD/growth design

Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2544756

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