4. Compositions
  5. Liquid crystal compositions
  6. Containing nonchiral aligning agents

Mu-San Chen

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Anti-charging layer for beam lithography and mask fabrication

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Reexamination Certificate

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Anti-charging layer for beam lithography and mask fabrication

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Reexamination Certificate

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Fluoropolymeric substrates with metallized surfaces and methods

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...
Patent

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Fluroropolymeric substrates with metallized surfaces and methods

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...
Patent

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Liquid crystal composition and alignment layer

Compositions – Liquid crystal compositions – Containing nonchiral aligning agents
Patent

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Profile ID: LFUS-PAI-P-1129709

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