4. Coating apparatus
  5. Gas or vapor deposition
  6. Multizone chamber

Moon-yong Lee

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Methods for forming films having high dielectric constants

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

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Systems for forming films having high dielectric constants

Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent

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Profile ID: LFUS-PAI-P-1612417

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