4. Cleaning and liquid contact with solids
  5. Processes
  6. Including application of electrical radiant or wave energy...

Mohammad R. Rakhshandehroo

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CF4+H2O plasma ashing for reduction of contact/via...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Plasma treatment for polymer removal after via etch

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate

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Water vapor plasma for effective low-k dielectric resist...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2493937

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