4. Coating apparatus
  5. Gas or vapor deposition
  6. Work support

Michal Danek

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Apparatus for substrate processing with improved throughput and

Coating apparatus – Gas or vapor deposition
Patent

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Barrier first method for single damascene trench applications

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Construction of a film on a semiconductor wafer

Semiconductor device manufacturing: process – Forming schottky junction – Using refractory group metal
Reexamination Certificate

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Construction of a film on a semiconductor wafer

Coating apparatus – Program – cyclic – or time control – Having prerecorded program medium
Reexamination Certificate

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Construction of a film on a semiconductor wafer

Semiconductor device manufacturing: process – Forming schottky junction – Using refractory group metal
Reexamination Certificate

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Profile ID: LFUS-PAI-P-328202

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