4. Cleaning and liquid contact with solids
  5. Processes
  6. Including use of vacuum, suction, or inert atmosphere

Michael J. Foline

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Combined process chamber with multi-positionable pedestal

Semiconductor device manufacturing: process – Chemical etching – Having liquid and vapor etching steps
Reexamination Certificate

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Vacuum compatible water vapor and rinse process module

Cleaning and liquid contact with solids – Processes – Including use of vacuum – suction – or inert atmosphere
Patent

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Profile ID: LFUS-PAI-P-516217

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