4. Semiconductor device manufacturing: process
  5. Coating of substrate containing semiconductor region or of...
  6. By reaction with substrate

Mehran Moalem

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Abatement of fluorine gas from effluent

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Reexamination Certificate

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Porous ceramic liner for a plasma source

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Process for forming silicon carbide films and microcomponents

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
Patent

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Profile ID: LFUS-PAI-P-1339749

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