4. Single-crystal, oriented-crystal, and epitaxy growth processes;
  5. Apparatus
  6. For crystallization from liquid or supercritical state

Masato Imai

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Apparatus and method for producing single crystal

Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus – For crystallization from liquid or supercritical state
Patent

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Apparatus for manufacturing semiconductor wafer

Cleaning and liquid contact with solids – Apparatus – Sequential work treating receptacles or stations with means...
Reexamination Certificate

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Color transflective LCD device having adjusting windows...

Liquid crystal cells – elements and systems – Particular structure – Having significant detail of cell structure only
Reexamination Certificate

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Epitaxial growth furnace

Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate

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Epitaxial growth furnace

Electric heating – Heating devices – Combined with container – enclosure – or support for material...
Reexamination Certificate

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Profile ID: LFUS-PAI-P-480920

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