4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

Masashi Yamage

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Microwave excitation plasma processing apparatus and microwave e

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Patent

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Plasma process end point determination method and apparatus,...

Electricity: measuring and testing – Using ionization effects – For analysis of gas – vapor – or particles of matter
Reexamination Certificate

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Plasma processing apparatus and a plasma processing method

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Profile ID: LFUS-PAI-P-176633

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