4. Etching a substrate: processes
  5. Masking of a substrate using material resistant to an etchant
  6. Mechanically forming pattern into a resist

Kuo-Yao Weng

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Debris-free wafer marking method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mechanically forming pattern into a resist
Patent

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Fluidic device

Chemical apparatus and process disinfecting – deodorizing – preser – Control element responsive to a sensed operating condition – Control element is fluid pressure sensitive
Reexamination Certificate

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Fluidic device

Chemical apparatus and process disinfecting – deodorizing – preser – Analyzer – structured indicator – or manipulative laboratory... – Miscellaneous laboratory apparatus and elements – per se
Reexamination Certificate

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Fluidic devices and controlling methods thereof

Chemical apparatus and process disinfecting – deodorizing – preser – Control element responsive to a sensed operating condition – Responsive to liquid level
Reexamination Certificate

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High performance binder/molder compounds for making precision me

Specialized metallurgical processes – compositions for use therei – Compositions – Loose particulate mixture containing metal particles
Patent

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Profile ID: LFUS-PAI-P-971308

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