4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Kouichi Hanzawa

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Optical film thickness controlling method and apparatus,...

Coating processes – Optical element produced
Reexamination Certificate

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Optical film thickness controlling method, optical film...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate

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Thin film forming apparatus and method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2322528

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