4. Organic compounds -- part of the class 532-570 series
  5. Organic compounds
  6. Silicon containing

Kenji Funatsu

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Polymer, resist composition and patterning process

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate

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Polymer, resist material and patterning processing

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate

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Resist polymer, resist composition and patterning process

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate

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Silylation of hydroxyl group-containing compound

Organic compounds -- part of the class 532-570 series – Organic compounds – Silicon containing
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2116312

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