4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Haruyuki Takano

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Parallel plate sputtering device with RF powered auxiliary elect

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Plasma device

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Plasma etching device

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Plasma method with high input power

Electric heating – Metal heating – By arc
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Haruyuki Takano does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Haruyuki Takano, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Haruyuki Takano will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-1636147

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure