4. Adhesive bonding and miscellaneous chemical manufacture
  5. Differential fluid etching apparatus
  6. With microwave gas energizing means

Haruhiro H. Goto

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Deposition of TEOS oxide using pulsed RF plasma

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate

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Plasma processing apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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System and method for gas distribution in a dry etch process

Etching a substrate: processes – Gas phase etching of substrate
Reexamination Certificate

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System and method for gas distribution in a dry etch process

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Profile ID: LFUS-PAI-P-1472463

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