4. Chemistry: electrical and wave energy
  5. Processes and products
  6. Coating, forming or etching by sputtering

Glyn Reynolds

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Immersed inductively—coupled plasma source

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
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Inductively-coupled plasma processing system

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With radio frequency antenna or inductive coil gas...
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Ionized PVD with sequential deposition and etching

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method and apparatus for ionized physical vapor deposition

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate

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Method and apparatus for ionized physical vapor deposition

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1129274

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