4. Chemistry: electrical and wave energy
  5. Processes and products
  6. Coating, forming or etching by sputtering

General Plasma, Inc.

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Cylindrical target with oscillating magnet for magnetron...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate

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Magnetic mirror plasma source and method using same

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
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