4. Semiconductor device manufacturing: process
  5. Formation of semiconductive active region on any substrate
  6. Polycrystalline semiconductor

Edgar Schönbächler

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  [ 4.80 ] – superior Voters 2   Comments 2

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Method for optimising the etch rate of polycrystalline layer

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Polycrystalline semiconductor
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Edgar Schönbächler has received 2 rating(s) and 2 review(s), resulting in an average rating of 4.80 on a scale from 1 to 5. The overall rating for this inventor is superior.

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Jean Aimar

The method described in this patent were extremely useful to optimise the ignition of my chimney.

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Jean Aimar

The method described in this patent were extremely useful to optimise the ignition of my chimney.

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Profile ID: LFUS-PAI-P-2085506

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