4. Etching a substrate: processes
  5. Masking of a substrate using material resistant to an etchant
  6. Mask is multilayer resist

Dong-Ki Yoon

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Method of fine patterning semiconductor device

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
Reexamination Certificate

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Method of fine patterning semiconductor device

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate

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