4. Etching a substrate: processes
  5. Nongaseous phase etching of substrate
  6. With measuring, testing, or inspecting

Clifford Owen Morgan, III

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Chemical-mechanical polishing apparatus with slurry removal syst

Abrading – Abrading process – Utilizing fluent abradant
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Endpoint detection by chemical reaction

Semiconductor device manufacturing: process – Including control responsive to sensed condition
Reexamination Certificate

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Endpoint detection by chemical reaction

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – For liquid etchant
Reexamination Certificate

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Endpoint detection by chemical reaction and light scattering

Semiconductor device manufacturing: process – Including control responsive to sensed condition
Reexamination Certificate

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Endpoint detection by chemical reaction and photoionization

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Profile ID: LFUS-PAI-P-355287

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