4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Combined with the removal of material by nonchemical means

Clariant Chimie S.A.

Corporate Assignee

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Corporate Assignee

active

No affiliations

Chemical mechanical polishing process for layers of isolating ma

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Process for the preparation of the enol lactone of 2-oxocyclohex

Organic compounds -- part of the class 532-570 series – Organic compounds – Heterocyclic carbon compounds containing a hetero ring...
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Clariant Chimie S.A. does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Clariant Chimie S.A., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Clariant Chimie S.A. will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-1394120

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure