4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

Chunshi Cui

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Enhancement of silicon oxide etch rate and nitride...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate

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Enhancement of silicon oxide etch rate and substrate...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate

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High pressure high non-reactive diluent gas content high...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate

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Inductive antenna for a plasma reactor producing reduced...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With radio frequency antenna or inductive coil gas...
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Plasma reactor with spoke antenna having a VHF mode with the...

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
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Profile ID: LFUS-PAI-P-873410

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