4. Computer-aided design and analysis of circuits and semiconductor
  5. Design of semiconductor mask or reticle
  6. Manufacturing optimizations

Chung-Kai Lin

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Characterization methodology for the thin gate oxide device

Semiconductor device manufacturing: process – With measuring or testing – Electrical characteristic sensed
Reexamination Certificate

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Table-based DFM for accurate post-layout analysis

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Manufacturing optimizations
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2251773

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