4. Measuring and testing
  5. Surface and cutting edge testing
  6. Roughness

Chikuang Charles Wang

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Method for fabricating an integrated gate dielectric layer...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
Reexamination Certificate

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Non-destructive ambient dynamic mode AFM amplitude versus...

Measuring and testing – Surface and cutting edge testing – Roughness
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2275240

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