4. Coating processes
  5. Centrifugal force utilized

Chih-Hsing Hsin

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Method for applying photoresist on wafer

Coating processes – Centrifugal force utilized
Patent

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Multi-pitch vernier for checking alignment accuracy

Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1712325

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