4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Combined with coating step

Cary Ching

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Gas chemistry for improved in-situ cleaning of residue for a CVD

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Patent

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Limited thermal budget formation of PMD layers

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized
Reexamination Certificate

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Method of forming phosphosilicate glass having a high wet-etch r

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Patent

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Profile ID: LFUS-PAI-P-1209350

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