4. Coating apparatus
  5. Program, cyclic, or time control

Byung-joo Youn

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Method of and apparatus for coating a wafer with a minimal layer

Coating apparatus – Program – cyclic – or time control
Patent

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Method of and apparatus for coating a wafer with a minimal...

Coating processes – Centrifugal force utilized
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1898880

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