Micro-processing method using a probe

Details Micro-processing method using a probe Micro-processing method using a probe

1998-06-02

2000-12-26

Berman, Jack

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

430296, H01L 2100, H01J 37317

Patent

active

061663867

ABSTRACT:
A micro-processing method is provided for forming a structure adapted to confine electrons within a micro-region. The method comprises steps of arranging a probe oppositely relative to a non-electroconductive thin film arranged on an electroconductive substrate, placing the probe on or near the surface to be processed of the non-electroconductive thin film, applying a voltage between the probe and the substrate to form an enhanced electroconductivity region as compared with the remaining area in the non-electroconductive thin film, and oxidizing the interface of the substrate and the non-electroconductive thin film.

REFERENCES:
patent: 5049461 (1991-09-01), Arnett et al.
patent: 5336892 (1994-08-01), Dobisz et al.
patent: 6020215 (2000-02-01), Yagi et al.
G. Binning, et al., "Surface Studies by Scanning Tunneling Microscopy", Physical Review Letters, 1982, vol. 49, pp. 57-61.

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