Process for forming deposited film

Details Process for forming deposited film Process for forming deposited film

1986-12-18

1988-03-01

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 531, 427 86, 437 16, 437 19, B05D 306

Patent

active

047285281

ABSTRACT:
A process for forming a deposited film comprises introducing into a film forming space housing a substrate therein an active species (A) formed by decomposition of a compound containing carbon and a halogen and an active species (B) formed from a chemical substance for film formation which is reactive with said active species (A) separately from each other, irradiating them with light energy and thereby allowing both the species to react with each other thereby to form a deposited film on the substrate.

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patent: 4410559 (1983-10-01), Hamakawa et al.
patent: 4419381 (1983-12-01), Yamazaki
patent: 4448801 (1984-05-01), Fukuda et al.
patent: 4450185 (1984-05-01), Shimizu et al.
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patent: 4514437 (1985-04-01), Nath
patent: 4532199 (1985-07-01), Ueno et al.
patent: 4546008 (1985-10-01), Saitoh
patent: 4554180 (1985-11-01), Hirooka
patent: 4564533 (1986-01-01), Yamazaki
patent: 4569697 (1986-02-01), Tsu et al.

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