Method of sputter deposition simulation by inverse trajectory ca

Details Method of sputter deposition simulation by inverse trajectory ca Method of sputter deposition simulation by inverse trajectory ca

1996-03-25

1998-05-12

Teska, Kevin J.

Boots, shoes, and leggings

36446902, 20419213, 20429803, 427 96, 118715, G06F 9455, C23C 1452, H01L 21203

Patent

active

057516073

ABSTRACT:
In a profile simulation of a thin film deposited on a substrate by sputtering, inverse trajectories from an area concerned of the substrate to a target are calculated by Monte Carlo method in order to reduce time required for the profile simulation. With trajectories arriving to the target and their generation probabilities, the profile simulation is performed applying a string model.

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