Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1994-03-28
1995-06-06
Chapman, Mark A.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430311, 430320, G03F 900
Patent
active
054222060
ABSTRACT:
A first anti-reflection film is inserted between a transparent glass substrate and the light shielding pattern. The first anti-reflection film has a refractive index larger than that of the glass substrate but smaller than that of the light shielding pattern. A second anti-reflection film is formed on the glass substrate between adjacent light shielding patterns. The second anti-reflection film has a refractive index larger than that of air but smaller than that of the glass substrate. Thus, a light beam entering the glass substrate is not reflected at the front surface of the glass substrate regardless of whether the light beam entered in a portion provided with a light shielding pattern.
REFERENCES:
patent: 4178403 (1979-12-01), Sakurai et al.
patent: 4411972 (1983-10-01), Narken et al.
patent: 4720442 (1988-01-01), Shinkai et al.
Chapman Mark A.
Mitsubishi Denki & Kabushiki Kaisha
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