Isolation of novolak resin by low temperature sub surface forced

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From phenol – phenol ether – or inorganic phenolate

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528137, 528230, 528501, 528503, 430192, 430193, 430270, C08G 804, C08G 1404

Patent

active

057506329

ABSTRACT:
A water insoluble, aqueous alkali soluble novolak resin, process for producing such a novolak resin, a photoresist containing such a novolak resin, and a method for producing a semiconductor device, wherein the resin is isolated by sub surface forced steam distillation.

REFERENCES:
patent: 5403696 (1995-04-01), Hioki et al.
patent: 5407780 (1995-04-01), Hioki et al.

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