Programmable ion beam patterning system

Details Programmable ion beam patterning system Programmable ion beam patterning system

1984-06-28

1985-06-18

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118728, 118 501, 118620, 156643, 156646, 156654, 204192E, 204298, B44C 122, C03C 1500, C03C 2506

Patent

active

045239711

ABSTRACT:
This ion beam system provides an ion beam pattern which is produced without the need for a mask. A programmable grid is used in combination with an ion beam source, where the apertures of the programmable grid can have electrical potentials associated therewith which either extract ions or impede the movement of ions through the apertures. Depending upon the electrical biasing provided to each of the apertures of the grid, different patterns of ions can be extracted through the grid. By changing the electrical bias at different locations on the programmable grid, these different patterns are produced. The patterns can be used for many applications, including patterned deposition, patterned etching, and patterned treatment of surfaces.

REFERENCES:
patent: 4259145 (1981-03-01), Harper et al.
patent: 4411733 (1983-10-01), Macklin et al.
patent: 4450031 (1984-05-01), Ono et al.

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