Aperture forming method

Fishing – trapping – and vermin destroying

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Details

437229, 437245, 437194, 1566591, H01L 21465, H01L 2147, H01L 21312

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active

049468049

ABSTRACT:
A method of forming through-holes in a multi-level interconnect system in which a layer of photo-resist is spun over a masking layer prior to mask-etching so that when the photo-resist is exposed and developed some remains in the bottom of through holes formed in the surface layer so as to protect the base layer from the mask-etching agent.

REFERENCES:
patent: 4174562 (1979-11-01), Sanders et al.
patent: 4253888 (1981-03-01), Kikuchi
patent: 4305974 (1981-12-01), Abe et al.
patent: 4335506 (1982-06-01), Chiu et al.
patent: 4381595 (1983-05-01), Denda et al.
patent: 4592800 (1986-06-01), Landau et al.
patent: 4631806 (1986-12-01), Poppert et al.
patent: 4718977 (1988-01-01), Contiero et al.

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