Apparatus for the reactive coating of a substrate

Details Apparatus for the reactive coating of a substrate Apparatus for the reactive coating of a substrate

1991-05-09

1992-12-08

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419213, 20429807, 20429808, 20429818, 20429819, C23C 1454

Patent

active

051695090

ABSTRACT:
A pair of magnetron cathodes in an evacuable coating chamber are each connected to an ungrounded output of an A.C. power supply. The discharge voltage of at least one of the cathodes is measured and the flow of reactive gas into the chamber is controlled so that the measured voltage is identical to a desired voltage.

REFERENCES:
patent: 3860507 (1975-01-01), Vossen, Jr.
patent: 4166784 (1979-09-01), Chapin et al.
patent: 4738761 (1988-04-01), Bobbio et al.
patent: 4956070 (1990-09-01), Nakada et al.
patent: 4981566 (1991-01-01), Wurczinger

Affiliated with

Also associated with

Rating

Apparatus for the reactive coating of a substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for the reactive coating of a substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for the reactive coating of a substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-958869