Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1997-08-07
1999-06-01
Berman, Jack I.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
355 53, 355 76, H01L 2100
Patent
active
059090308
ABSTRACT:
The pattern transfer apparatus includes a first substrate on which a circuit pattern of an arbitrary semiconductor device is drawn, a first stage including a substrate holding mechanism for holding the first substrate, an illumination optical system for illuminating the circuit pattern of the semiconductor device drawn on the first substrate, a second stage on which a second substrate can be mounted, a reducing optical system or an equimultiple optical system for transferring a part of the circuit pattern of the semiconductor device drawn on the first substrate, and a mechanism for moving at least one of first and second elements, the first element being one of the first and second stages and the second element being the reducing optical system or an equimultiple optical system, wherein the first stage has a holding mechanism for holding one of substrates of at least two sizes and for changing a gripping force in accordance with the sizes of the substrates.
REFERENCES:
patent: 4757355 (1988-07-01), Iizuka et al.
patent: 4924258 (1990-05-01), Tsutsui
Itoh Masamitsu
Takigawa Tadahiro
Yoshitake Shusuke
Berman Jack I.
Kabushiki Kaisha Toshiba
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