Phase shifting photomask with two different transparent regions

Details Phase shifting photomask with two different transparent regions Phase shifting photomask with two different transparent regions

1997-03-31

1999-06-01

Codd, Bernard

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

059087188

ABSTRACT:
Disclosed is a photomask, which has: a transparent substrate; and masking film which is selectively formed on the transparent substrate to provide a predetermined pattern composed of a transparent region and a masking region; wherein the transparent region comprises a first transparent region which is formed adjacent to the masking region and extends like a belt along the masking region and a second transparent region which lies sandwiching the first transparent region with the masking region, whereby a phase of exposure light through the first transparent region is advanced prior to that through the second transparent region.

REFERENCES:
patent: 5244759 (1993-09-01), Pierrat
patent: 5275896 (1994-01-01), Garofalo et al.
patent: 5300378 (1994-04-01), Minami
patent: 5348826 (1994-09-01), Dao et al.
patent: 5352550 (1994-10-01), Okamoto
patent: 5354632 (1994-10-01), Dao et al.
patent: 5358808 (1994-10-01), Nitayama et al.
patent: 5405721 (1995-04-01), Pierrat
patent: 5688409 (1997-11-01), Dao et al.
Pierrat et al., "Phase-Shifting Mask Topography Effects on Lithographic Image Quality", SPIE vol. 1927, Optical/Laser Microlithography VI pp. 28-41, 1993.

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