Method for controlling the thickness distribution of an interfer

Details Method for controlling the thickness distribution of an interfer Method for controlling the thickness distribution of an interfer

1989-04-20

1990-07-17

Bueker, Richard

Coating processes

Nonuniform coating

118720, 118729, 118730, 4272481, 4272555, 427282, C23C 1600

Patent

active

049420631

ABSTRACT:
The thickness distribution of a vapor deposited layer such as an interference filter deposited on a moving substrate such as a glass faceplate for a projection television tube, is controlled along an axis in the direction of travel of the substrate by employing at least one rotatable dodger to partially shield the substrate as it passes behind the dodger during deposition.

REFERENCES:
patent: 3636916 (1972-01-01), Thelen et al.
patent: 3664295 (1972-05-01), Ng et al.
Fowler, A. B. and D. R. Young, "Apparatus for Evaporating Thin Coatings with In Situ Control of Thickness", IBM Technical Disclosure Bulletin, vol. 20, no. 7, (Dec. 1977), pp. 2876-2877.

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