Cathodic sputtering apparatus

Details Cathodic sputtering apparatus Cathodic sputtering apparatus

1983-08-17

1984-04-17

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

044433182

ABSTRACT:
A rotatable magnetron cathode comprising an elongated cylindrical tubular member, magnetic means disposed in said tubular member, a plurality of individual target strips provided with the same or different coating materials to be sputtered removably secured to the tubular member, said target strips extending the axial direction of the tubular member and disposed in spaced parallel relation around the periphery thereof, and means for rotating or indexing the tubular member to bring selected target strips in position for sputtering opposite the magnetic means.

REFERENCES:
patent: 4221652 (1980-09-01), Kuriyama
patent: 4290877 (1981-09-01), Blickensderfer
patent: 4356073 (1982-10-01), McKelvey
patent: 4374722 (1983-02-01), Zega
patent: 4376025 (1983-03-01), Zega

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