Sensitizers for photopolymerization

Details Sensitizers for photopolymerization Sensitizers for photopolymerization

1979-12-28

1982-02-16

Bleutge, John C.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

20415919, 20415920, 20415923, 20415924, 430281, 430916, 430919, 430920, 430921, 525348, 525375, 525383, 526204, 526208, C08F 250, C08J 328

Patent

active

043158072

ABSTRACT:
Aromatic-aliphatic ketones of the formulae I, II, III or IV ##STR1## wherein n is 1 or 2, Ar is an aryl radical, R.sup.1 and R.sup.2 are monovalent aliphatic, cycloaliphatic or araliphatic radicals, R.sup.3 is a direct bond or a divalent organic radical, X is a hydroxyl or amino group or the monovalent etherification or silylation products thereof, and X' is a divalent amino, ether or silyloxy group, Y is a direct bond or CH.sub.2 and Z is O, S, SO.sub.2, CH.sub.2 or C(CH.sub.3).sub.2, are suitable sensitizers for the photopolymerization of unsaturated compounds and for the photochemical crosslinking of polyolefins. Some of these compounds are novel and can be obtained by methods analogous to those for obtaining the known compounds of this type.

REFERENCES:
patent: 2588123 (1947-03-01), Kern
patent: 2722512 (1955-11-01), Crandall
patent: 3160665 (1964-12-01), Siegrist et al.
patent: 3829467 (1974-08-01), Diamond et al.
patent: 3998712 (1976-12-01), Hickmann et al.

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