Organic compounds -- part of the class 532-570 series – Organic compounds – Heterocyclic carbon compounds containing a hetero ring...
Patent
1998-11-10
2000-02-01
Powers, Fiona T.
Organic compounds -- part of the class 532-570 series
Organic compounds
Heterocyclic carbon compounds containing a hetero ring...
C07D31158, C07D31170, C07D31172
Patent
active
060205040
ABSTRACT:
Chroman derivatives of the general formula: ##STR1## in which R.sup.1 is hydrogen or C.sub.1-4 -alkyl; R.sup.2 is C.sub.1-6 -alkyl, C.sub.3-6 -cycloalkyl, optionally substituted aryl or optionally substituted aryl-C.sub.1-6 -alkyl; R.sup.3, R.sup.5 and R.sup.6 independently of one another are hydrogen, halogen, C.sub.1-4 -alkyl or optionally substituted aryl; and R.sup.4 is C.sub.1-6 -alkyl, C.sub.3-6 -cycloalkyl, (C.sub.1-6 -alkoxy)methyl, optionally substituted aryl, optionally substituted aryl-C.sub.1-6 -alkyl, C-alkanoyl or optionally substituted aroyl, are obtained from hydroquinone derivatives and alkenes in the presence of Lewis acids. The chroman derivatives (I) are intermediates in the synthesis of pharmaceutical active ingredients, for example, of hypolipidemics.
REFERENCES:
patent: 4344886 (1982-08-01), Horner et al.
patent: 5364946 (1994-11-01), Laffan
Bolon, J. Org. Chem., 35(11), 1970, 3666-3670.
Wan et al., Can. J. Chem., 74, 1996, 465-475.
T. Yoshioka et al., J. Med. Chem., (1989), 32, pp. 421-428.
Comprehensive Heterocyclic Chemistry, (Ed.: A. J. Boulton and A. McKillop), Pergamon Press, Oxford, vol. 3 Part 2B, pp. 778-787.
L. I. Smith and R. B. Carlin, J. Am. Chem Soc., (1942), 64, pp. 524-527.
Lonza AG
Powers Fiona T.
LandOfFree
Process for the preparation of chroman derivatives does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for the preparation of chroman derivatives, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the preparation of chroman derivatives will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-938862