Photoresist treating composition consisting of a mixture of prop

Details Photoresist treating composition consisting of a mixture of prop Photoresist treating composition consisting of a mixture of prop

1989-05-15

1991-01-08

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430141, 430192, 430193, 430149, 430302, 430303, 430309, 430325, 430326, 430329, G03C 1106, G03F 742, G03F 732, G03F 716

Patent

active

049834908

ABSTRACT:
The invention provides a mixture suitable for treating a photographic composition which comprises from about 1 to about 10 parts by weight of a propylene glycol alkyl ether and from about 1 to about 10 parts by weight of a propylene glycol alkyl ether acetate.

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