Method for manufacturing low work function surfaces

Details Method for manufacturing low work function surfaces Method for manufacturing low work function surfaces

1998-03-20

2000-09-12

Gulakowski, Randy

Etching a substrate: processes

Forming or treating an article whose final configuration has...

216 40, 216 54, 216 66, 216 67, 430199, 430296, 430302, 430310, G25F 302

Patent

active

061173444

ABSTRACT:
Methods for fabricating nano-structured surfaces having geometries in which the passage of elementary particles through a potential barrier is enhanced are described. The methods use combinations of electron beam lithography, lift-off, and rolling, imprinting or stamping processes.

REFERENCES:
patent: 4686162 (1987-08-01), Stangl et al.
patent: 5119151 (1992-06-01), Onda
patent: 5229320 (1993-07-01), Ugajin
patent: 5233205 (1993-08-01), Usagawa et al.
patent: 5247223 (1993-09-01), Mori et al.
patent: 5332952 (1994-07-01), Ugajin et al.
patent: 5371388 (1994-12-01), Oda
patent: 5521735 (1996-05-01), Shimizu et al.
patent: 5579232 (1996-11-01), Tong et al.
patent: 5722242 (1998-03-01), Edelson
patent: 5772905 (1998-06-01), Chou
Chou et al., Imprint Lithography with 25 Namometer Resolution, Science vol. 272, pp. 85-87, Apr. 5, 1996.
Electronic Engineering Times, Feb. 23, 1998, pp. 43 and following.

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