Positive photoresist composition with 1,2 naphthoquinone diazide

Details Positive photoresist composition with 1,2 naphthoquinone diazide Positive photoresist composition with 1,2 naphthoquinone diazide

1986-02-04

1988-01-12

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430193, 430326, 528153, 534557, G03C 160, G03C 154

Patent

active

047191678

ABSTRACT:
Disclosed herein is a positive photoresist composition containing (a) a photosensitizer of 1,2-naphthoquinone diazides photosensitive-material comprising an ester of 2,3,4,4'-tetrahydroxybenzophenone in which on the average, not less than two hydroxy groups of 2,3,4,4'-tetrahydroxybenzophenone have been esterified by 1,2-naphthoquinonediazide-5-sulfonic acid and (b) a novolak resin obtained by condensing a mixture of m-cresol, p-cresol and 2,5-xylenol with formaldehyde.

REFERENCES:
patent: 3106465 (1963-10-01), Neugebauer et al.
patent: 4275139 (1981-06-01), Stahlhofer
patent: 4404357 (1983-09-01), Taylor et al.
patent: 4424315 (1984-01-01), Taylor et al.
patent: 4439516 (1984-03-01), Cornigliaro et al.
patent: 4499171 (1985-02-01), Hosaka et al.
patent: 4551409 (1985-11-01), Gulla et al.
patent: 4587196 (1986-05-01), Toukhy

Affiliated with

Also associated with

Rating

Positive photoresist composition with 1,2 naphthoquinone diazide does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive photoresist composition with 1,2 naphthoquinone diazide, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive photoresist composition with 1,2 naphthoquinone diazide will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-921044