Chemistry: electrical and wave energy – Processes and products
Patent
1986-02-27
1988-01-12
Tung, T.
Chemistry: electrical and wave energy
Processes and products
204434, 427304, 427305, G01N 2746, B05D 310
Patent
active
047189908
ABSTRACT:
A method for detecting a start point of electroless plating, which comprises the steps of: immersing a couple of metal electrodes in an electroless plating solution; connecting the metal electrodes to a DC power supply to serve as an anode and a cathode, respectively; applying an electric current across the metal electrodes immediately before immersing an object to be electroless plated in the solution thereby causing metal deposition from the solution at the cathode to activate the same; measuring the potential difference between the activated cathode and the object to be plated; and detecting start of the electroless plating of the object from the measured value of the potential difference between the activated cathode and the object. Also disclosed is an apparatus for carrying out the method of the invention.
REFERENCES:
patent: 3138479 (1964-06-01), Foley
patent: 3438875 (1969-04-01), Watanabe et al.
patent: 4055751 (1977-10-01), Bussman et al.
patent: 4132605 (1979-01-01), Tench et al.
patent: 4146437 (1979-03-01), O'Keefe
patent: 4479980 (1984-10-01), Acosta et al.
patent: 4541902 (1985-09-01), Kinoshita et al.
Hashimoto Shigeo
Sugiura Yutaka
C. Uyemura & Co., Ltd.
Tung T.
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