Calibration method for electron beam exposer

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250396ML, 382 22, 324404, G01M 2300

Patent

active

047630043

ABSTRACT:
A method of correcting the aberration of an electron beam due to astigmatism and field curvature of focus by feeding a correction current through stigmator coils and a focus correction coil. The correction currents are determined by measuring a sharpness P of the electron beam. The sharpness P is defined as a product of p.sub.x, a sharpness measured when the electron beam is deflected in X direction, and p.sub.y, a sharpness measured when the electron beam is deflected in Y direction: P=p.sub.x .times.p.sub.y. The use of the sharpness P provides good convergence of the measurements and it becomes possible to calibrate the electron beam for many points in the scanning field. Thus, it is possible to attain maximum resolution over an entire scanning field. Optimum correction currents are determined from data obtained by varying each correction current while keeping the other correction currents constant to obtain several values of P and then using a least square approximation of the measured values of P with a quadrature curve.

REFERENCES:
patent: 4162403 (1979-07-01), Baumgarten
patent: 4180738 (1979-12-01), Smith
patent: 4214163 (1980-07-01), Namae
patent: 4336597 (1982-06-01), Okubo et al.
patent: 4362942 (1982-12-01), Yasuda
patent: 4363104 (1982-12-01), Nussmeier
patent: 4553260 (1985-11-01), Belt
patent: 4585943 (1986-04-01), Yasuda
patent: 4607333 (1986-08-01), Yasutake
Engelke: "Correction of Nonlinear Deflection Distortion . . . ", IBM J. Res. Develop.-Nov. 1977-pp. 506-513.
Patent Abstracts of Japan, vol. 5, No. 55, (E-52)[727], Apr. 16, 1981, & JP-A56 7341, (Nippon Denshi K.K.), 01-26-81.
Patent Abstracts of Japan, vol. 7, No. 62, (E-164)[1207], May 15, 1983; and JP-A-57 208 140, (Fujitsu K.K.), 12-21-82.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Calibration method for electron beam exposer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Calibration method for electron beam exposer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Calibration method for electron beam exposer will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-919911

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.