Direct metallization process

Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

204125, 204166, C25D 556

Patent

active

053762487

ABSTRACT:
A direct metallization process is disclosed wherein plastic substrates may be electrolytically plated without the need for any prior electroless plating. The process uses a specially formulated post-activator composition at an elevated temperature to treat the activated substrate comprising either an alkaline solution containing an effective amount of metal ions which undergo a disproportionation reaction or an alkaline solution containing a metal ion such as Cu.sup.+2.

REFERENCES:
patent: 3011920 (1961-12-01), Shipley, Jr.
patent: 3099608 (1963-07-01), Radovsky et al.
patent: 3692502 (1972-09-01), Hangelar et al.
patent: 3725108 (1973-04-01), Sanbestre et al.
patent: 4171225 (1979-10-01), Molenaar et al.
patent: 4895739 (1990-01-01), Bladon
patent: 5213841 (1993-05-01), Gulla et al.
F A Lowenheim, Electroplating, McGraw-Hill Book Co., New York, 1978, pp. 404-405, 418-423.
A. Molenaar et al, Autocatalytic Deposition of Tin, J. Electrochem. Soc., vol. 136, No. 2, Feb. 1989, pp. 378-382.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Direct metallization process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Direct metallization process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Direct metallization process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-916469

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.