Fishing – trapping – and vermin destroying
Patent
1991-04-04
1992-10-27
Gellner, Michael L.
Fishing, trapping, and vermin destroying
437 10, G03D 500
Patent
active
051593742
ABSTRACT:
During development of photoresist on the frontside of a semiconductor wafer, developer solution is prevented from contaminating the backside of a wafer by using a film of de-ionized water to seal the backside. The wafer is mounted to a vacuum chuck, which is in contact with the backside of the wafer. A ring member having a top surface is positioned adjacent to the backside of the wafer mounted to the vacuum-chuck. The film of de-ionized water is formed between the backside of the wafer and the ring so that the film of deionized water provides a seal to prevent developer solution from being drawn by vacuum pressure to the area on the backside of the wafer which is adjacent to the vacuum chuck. To aid in formation of the water sealing ring, the top surface of the ring if formed of a non-wetting material and a circular groove is formed in the top surface. A housing from which the ring projects provides a shield for developer solution. The housing includes an internal water channel for supplying de-ionized water and has a plurality of connecting channels between the internal water channel and the groove formed in the top surface of the ring. The backside of the wafer is also sprayed with a water rinse. Means are provided for draining water from the housing and for preventing a reduced pressure from existing within the housing.
REFERENCES:
patent: 4922277 (1990-05-01), Carlson et al.
Gellner Michael L.
Rutledge D.
VLSI Technology Inc.
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