Method of fabricating integrated thin film solar cells

Details Method of fabricating integrated thin film solar cells Method of fabricating integrated thin film solar cells

1997-08-25

1999-09-21

Dutton, Brian

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

438 98, 438940, H01L 2100

Patent

active

059565721

ABSTRACT:
A method is provided for fabricating solar cells. A transparent conductive film is formed on a transparent substrate having an insulative surface and the transparent conductive film is segmented by a first scribing step to form transparent conductive film electrodes. An amorphous semiconductor layer is formed on the resulting substrate having the transparent conductive film electrodes. The amorphous semiconductor layer is segmented by a second scribing step to form amorphous semiconductor photoelectric conversion layers. A rear electrode layer is formed on the resulting substrate having the amorphous semiconductor photoelectric conversion layers and this rear electrode layer is segmented by a third scribing step to form rear electrodes. The third scribing step includes forming a resist film on the rear electrode layer, forming trenches in the resist film by laser scribing and etching off portions of the rear electrode layer with an etchant by using the resulting resist film as a mask.

REFERENCES:
patent: 5147468 (1992-09-01), Deguchi
patent: 5217921 (1993-06-01), Kaido et al.
patent: 5236516 (1993-08-01), Noguchi et al.
patent: 5527716 (1996-06-01), Kusian et al.

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