Coating apparatus – Gas or vapor deposition – With treating means
Patent
1988-04-25
1990-07-17
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
20429806, 20429813, 20429816, 427 35, 427 47, C23C 1650
Patent
active
049414305
ABSTRACT:
An apparatus for forming a reactive deposition film includes a member for supporting a body to be coated in a vacuum chamber; an evaporation source of element constituting the reactive deposition film; apparatus for introducing a reaction gas into the vacuum chamber; bias apparatus for applying a high frequency or radio frequency (rf) bias voltage to the body; an electron beam generator for supplying electron beams towards the body; and a magnetic field generator which generates such a magnetic field that distributes the electron beams supplied from the electron beam generator uniformly to the whole region adjacent to the surface of the body and traps electrons from the electron beams in the region, whereby plasma of high density can be formed uniformly in the whole region adjacent to the surface of the body. In another apparatus, further a second bias apparatus for applying a DC (direct current) bias voltage or AC (alternate current) bias voltage to the gas introducing apparatus for activating the reaction is provided.
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Inagawa Konosuke
Saito Kazuya
Watanabe Kazuhiro
Yuchi Yoshiyuki
Bueker Richard
Nihon Sinku Gijutsu Kabusiki Kaisha
Owens Terry J.
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