Method for correction for chromatic aberration and exposure appa

Details Method for correction for chromatic aberration and exposure appa Method for correction for chromatic aberration and exposure appa

1987-07-07

1988-11-01

Griffin, Donald A.

Photocopying

Projection printing and copying cameras

Identifying, composing, or selecting

355 53, G03B 2752

Patent

active

047823682

ABSTRACT:
Disclosed is an exposure apparatus used in a photolithographic process in fabrication of semiconductor devices. More particularly, in the exposure apparatus using an excimer laser, the beam splitter, mirror and lens for correction for chromatic aberration are combined in the alignment optical system. Furthermore, a mirror is disposed at the opposite side of the image pickup camera of the alignment key by way of the beam splitter.

REFERENCES:
patent: 4402596 (1983-09-01), Kanatani
patent: 4592648 (1986-06-01), Tabarelli et al.
patent: 4653903 (1987-03-01), Torigoe et al.
patent: 4685807 (1987-08-01), Picard

Affiliated with

Also associated with

Rating

Method for correction for chromatic aberration and exposure appa does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for correction for chromatic aberration and exposure appa, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for correction for chromatic aberration and exposure appa will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-893695